真空ポンプ、真空技術を次世代に。アルバック九州株式会社

Material production business

Materials Production Division Making the Times Making Materials

We will lead the thin film materials of the future with a thorough supply system using the latest manufacturing technology.

In 1982, the company began manufacturing sputtering targets for semiconductor devices in Kyushu, which was then called Silicon Island.Since then, we have established a system that can supply aluminum alloy materials using the latest manufacturing technologies such as vacuum melting methods, and deposition materials such as transparent conductive films for flat panel displays, typified by flat TVs, through integrated manufacturing from raw materials to bonding.

Essential Technology for Thin Film Formation -Sputtering Method

Essential Technology for Thin Film Formation -Sputtering Method

A typical method of producing thin films is sputtering (sputtering), and the technology is an application of the phenomenon that both ends of a fluorescent lamp become black.The name was given to me because it was a sputtering in English.

ManufacturingUsing Manufacturing Vacuum

We manufacture high-purity target materials with few impurities and gas components in our own process using vacuum technology.

Vacuum melting furnace

Vacuum melting furnace

Machining and BondingMachining and Bonding

The target material is precisely processed using machining centers, etc.
The target material and the backing plate (cooling plate) are bonded (joined) using a low material.

Ultrasonic flaw detector (bonding inspection)

Ultrasonic flaw detector (bonding inspection)

Quality ControlQuality Control

We possess advanced analysis and inspection equipment for composition and purity analysis of target materials.
We have a thorough quality control system.

Inspection scene

Inspection scene