Vacuum pump, Vacuum technology for the next generation.




Here is a summary of the principles of vacuum.
Next is sputtering.If you write in English, it’s sputtering.
It’s a word you’re not familiar with, isn’t it?The meaning of sputter is the state that produces the sound of the popping fly ing, such as a crackling, a juju.Derived from it, it has the meaning of splash action.

What is sputtering?

The sputtering, in a space filled with inert gas such as Ar (argon), argon is atomized by discharging a high voltage to the material (target), it is knocked out the target atom by colliding with the target, It is a technology that adheres to the substrate and forms a thin film.

So what do you do if you want to attach something to the board?

In the case of target: Al (aluminum).

  • Argon gas is introduced into the vacuum chamber to create an argon atmosphere.When argon gas is put in, it is not completely neutral, and some electrons will float.
  • By applying a potential, electrons collide with the flowing argon gas and divide into “Ar+” and “e-“.
  • “Ar+” is attracted to targets that are “negative”.
  • Aluminum pops out of the target where “Ar+” hits and adheres to the substrate.
    This is the principle of sputtering.
Principle of sputtering

What is Argon?

Argon is an inert gas.
Oxygen is active.Aluminum and oxygen react, but aluminum and argon do not.
 This is called an inert gas.

What is Argon? Illustrations

Target material 
The thin film material is sintered, and after the plate shape or disk shape, the paste is used on a metal plate called a packing plate.

Argon gas
The reason for using argon is that it is necessary to replace oxygen and water vapor in highly reactive air with less reactive gases.Nitrogen and argon are often used as lowly reactive gases.Since nitrogen is reactive at high temperatures, argon gas is often used.Argon is an inert gas.It is a gas that is 1% in the air that does not react.

Kirishima Amu